Thermal Properties | Metric | English | Comments |
---|---|---|---|
Melting Point | 21.0 °C | 69.8 °F | |
H.C. Starck Baymetec® Tantalum Ethoxide |
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Melting Point | <= 21.0 °C | <= 69.8 °F | |
H.C. Starck Baymetec® Tantalum n-Butoxide |
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Melting Point | 21.0 °C | 69.8 °F | |
Solvay Chemicals PHOSPHORIC ACID 80% - 87% Phosphoric Acid is highly selective in etching Si3N4 instead of SiO2. In combination with INTEROX® hydrogen peroxide and water, it is used to etch aluminum and InGaAs selective to InP. CAS-No.: 7.. |