Mechanical Properties | Metric | English | Comments |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ 3022-35 Bisbenzocyclobutene (BCB) Electronic Resin This product was developed for use as spin-on dieletric materials in microelectronic fabrication.Information provided by Dow |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ 3022-46 Bisbenzocyclobutene (BCB) Electronic Resin This product was developed for use as spin-on dieletric materials in microelectronic fabrication.Information provided by Dow |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ 3022-57 Bisbenzocyclobutene (BCB) Electronic Resin This product was developed for use as spin-on dieletric materials in microelectronic fabrication.Information provided by Dow |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ 3022-63 Bisbenzocyclobutene (BCB) Electronic Resin This product was developed for use as spin-on dieletric materials in microelectronic fabrication.Information provided by Dow |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ 4022-35 Advanced Electronic Resins (PhotoBisbenzocyclobutene BCB) CYCLOTENE™ 4022-35 advanced electronic resin is I-line-, G-line-, and broad band-sensitive photopolymer that has been developed for use as a dielectric in thin film microelectronic applications.Inf.. |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ 4024-40 Advanced Electronic Resins (PhotoBisbenzocyclobutene BCB) CYCLOTENE™ 4024-40 advanced electronic resin is I-line-, G-line-, and broad band-sensitive photopolymer that has been developed for use as a dielectric in thin film microelectronic applications.Inf.. |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ 4026-46 Advanced Electronic Resins (PhotoBisbenzocyclobutene BCB) CYCLOTENE™ 4026-46 advanced electronic resin is I-line-, G-line-, and broad band-sensitive photopolymer that has been developed for use as a dielectric in thin film microelectronic applications.Inf.. |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ XU35075 Advanced Electronic Resins (PhotoBisbenzocyclobutene BCB) CYCLOTENE™ XU35075 advanced electronic resin is I-line-, G-line-, and broad band-sensitive photopolymer that has been developed for use as a dielectric in thin film microelectronic applications.Inf.. |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ XU35132 Advanced Electronic Resins (PhotoBisbenzocyclobutene BCB) CYCLOTENE™ XU35132 advanced electronic resin is I-line-, G-line-, and broad band-sensitive photopolymer that has been developed for use as a dielectric in thin film microelectronic applications.Inf.. |
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Shear Modulus | 1.01 - 1.16 GPa | 146 - 168 ksi | Calculated |
Dow CYCLOTENE™ XU35133 Advanced Electronic Resins (PhotoBisbenzocyclobutene BCB) CYCLOTENE™ XU35133 advanced electronic resin is I-line-, G-line-, and broad band-sensitive photopolymer that has been developed for use as a dielectric in thin film microelectronic applications.Inf.. |